<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-09-24T03:00:11Z</responseDate><request verb="GetRecord" identifier="oai:www.repository.cam.ac.uk:1810/382757" metadataPrefix="uketd_dc">https://api.repository.cam.ac.uk/server/oai/request</request><GetRecord><record><header><identifier>oai:www.repository.cam.ac.uk:1810/382757</identifier><datestamp>2025-04-17T00:42:33Z</datestamp><setSpec>com_1810_34586</setSpec><setSpec>com_1810_256064</setSpec><setSpec>col_1810_205358</setSpec></header><metadata><uketd_dc:uketddc xmlns:uketd_dc="http://naca.central.cranfield.ac.uk/ethos-oai/2.0/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcterms="http://purl.org/dc/terms/" xmlns:uketdterms="http://naca.central.cranfield.ac.uk/ethos-oai/terms/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:doc="http://www.lyncode.com/xoai" xsi:schemaLocation="http://naca.central.cranfield.ac.uk/ethos-oai/2.0/ http://naca.central.cranfield.ac.uk/ethos-oai/2.0/uketd_dc.xsd">
   <dc:title>A Schottky-to-Ohmic Transition in Epitaxial Ferroelectric Hafnia Devices</dc:title>
   <dc:identifier xsi:type="dcterms:DOI">https://doi.org/10.17863/CAM.117408</dc:identifier>
   <dc:creator>Müller, Moritz</dc:creator>
   <uketdterms:advisor>Driscoll, Judith</uketdterms:advisor>
   <dcterms:abstract>The development of analog resistive non-volatile memory elements is of great interest for
future information storage technology. These devices can be used to emulate the electronic
behaviour of biological synapses and neurons for neuromorphic computing or sensing
applications. Hafnia is a promising material to use in resistive memory systems due to its
high industrial compatibility. Both the migration of oxygen ions and ferroelectricity are two
mechanisms actively being explored to drive resistance change in hafnia based devices. This
thesis explores the interplay between interfacial redox chemistry and ferroelectricity and how
these influence the resistance switching behaviour in epitaxial hafnia films.
A device stack is engineered to elicit large resistance changes through both ferroelectricity
and interfacial redox reactions. Ultra-thin epitaxial Y doped HfO2 (YHO) is grown with
a controlled oxygen stoichiometry. To stabilise the polar phase in YHO and provide a
resistance-tuneable bottom interface, YHO is grown on La0.66Sr0.33MnO3 (LSMO) buffered
Nb doped SrTiO3 substrates. In-depth X-Ray diffraction based structural analysis identified
the polar nature of the film and a strain induced rhombohedral distortion. Ferroelectricity in
the film was confirmed by piezoresponse force microscopy. In device configuration, using an
Au top electrode with an ultra-thin Ti adhesion layer, a resistance switching mode with large
on-off ratio was observed. The pristine device was stabilised in an intermediate resistance
state and did not need an electro-forming process. The mode reversibly switched between
a purely capacitive (Schottky) and resistive (Ohmic) state, a Schottky-to-Ohmic transition
(SOT). A series of voltage pulse trains were used to explore the intermediate resistance
states of the system. Both analog and integration behaviour was demonstrated, depending on
the pulse profile. The SOT may therefore find application as both a synapse and a neuron
respectively in neuromorphic applications.
Capacitance-voltage measurements were employed to correlate the ferroelectric polarisa-
tion reversal with the SET process and not the RESET process. Therefore, ferroelectricity
was indicated to only be partially responsible for the observed resistance change. Electrode
area dependent current measurements suggested that in the low resistance state, current
transport occurred through a localised conductive filament. A detailed analysis of the inter-
face chemistry suggested the importance of precisely designed oxygen scavenging at both interfaces to stabilise the SOT. Furthermore, interface stoichiometry changes were observed
during resistance switching by a combined hard photo-electron spectroscopy and electron
energy loss spectroscopy study.
Impedance spectroscopy measurements were used to correlate the stoichiometry changes
at the LSMO|YHO interface to resistance changes during the SOT. The conductive pristine
resistance state was shown to predominantly be limited by the LSMO|YHO interface and was
proposed to occur due to oxygen scavenging at the top electrode, by-passing through-grain
conduction. Analysis of the SOT analog switching behaviour showed that both the YHO
layer and the LSMO|YHO interface switch separately during the RESET operation, but
simultaneously during the SET process. Furthermore, stack modifications demonstrated the
importance of using an ultra-thin LSMO to stabilise the SOT. It was hypothesised to occur
due to interface strain enhanced defect formation, oxygen transfer or symmetry changes at
the LSMO|YHO interface.</dcterms:abstract>
   <uketdterms:institution>University of Cambridge</uketdterms:institution>
   <dcterms:issued>2024-08-30</dcterms:issued>
   <dc:type>Thesis</dc:type>
   <uketdterms:qualificationlevel>Doctoral</uketdterms:qualificationlevel>
   <uketdterms:qualificationname>Doctor of Philosophy (PhD)</uketdterms:qualificationname>
   <dc:language>eng</dc:language>
   <dcterms:isReferencedBy xsi:type="dcterms:URI">https://www.repository.cam.ac.uk/handle/1810/382757</dcterms:isReferencedBy>
   <dc:identifier xsi:type="dcterms:URI">https://apollo8-f-pro.lib.cam.ac.uk/bitstreams/f505cbd5-5409-4f04-a71c-f24d994c22af/download</dc:identifier>
   <uketdterms:checksum xsi:type="uketdterms:MD5">226d8a490278d84dc229c1b7addba0af</uketdterms:checksum>
   <dcterms:license>https://apollo8-f-pro.lib.cam.ac.uk/bitstreams/1557085f-9d36-4a1c-870c-a349a71af969/download</dcterms:license>
   <uketdterms:checksum xsi:type="uketdterms:MD5">87eda9de84448d1f82354d60eee3eb5f</uketdterms:checksum>
   <dc:rights>http://purl.org/NET/rdflicense/allrightsreserved</dc:rights>
   <dc:subject>Ferroelectricity</dc:subject>
   <dc:subject>Epitaxy</dc:subject>
   <dc:subject>Memristor</dc:subject>
</uketd_dc:uketddc>
</metadata></record></GetRecord></OAI-PMH>