<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-09-22T22:36:06Z</responseDate><request verb="GetRecord" identifier="oai:www.repository.cam.ac.uk:1810/274912" metadataPrefix="uketd_dc">https://api.repository.cam.ac.uk/server/oai/request</request><GetRecord><record><header><identifier>oai:www.repository.cam.ac.uk:1810/274912</identifier><datestamp>2024-06-26T13:50:18Z</datestamp><setSpec>com_1810_213729</setSpec><setSpec>com_1810_256065</setSpec><setSpec>col_1810_219485</setSpec></header><metadata><uketd_dc:uketddc xmlns:uketd_dc="http://naca.central.cranfield.ac.uk/ethos-oai/2.0/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcterms="http://purl.org/dc/terms/" xmlns:uketdterms="http://naca.central.cranfield.ac.uk/ethos-oai/terms/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:doc="http://www.lyncode.com/xoai" xsi:schemaLocation="http://naca.central.cranfield.ac.uk/ethos-oai/2.0/ http://naca.central.cranfield.ac.uk/ethos-oai/2.0/uketd_dc.xsd">
   <dc:title>GaN-on-Silicon HEMTs and Schottky diodes for high voltage applications</dc:title>
   <dc:identifier xsi:type="dcterms:DOI">10.17863/CAM.22063</dc:identifier>
   <dc:creator>Efthymiou, Loizos</dc:creator>
   <uketdterms:advisor>Udrea, Florin</uketdterms:advisor>
   <dcterms:abstract>Gallium Nitride (GaN) is considered a very promising material for use in the field
of power devices as its application in power systems would result in a significant
increase in the power density, reduced power losses, and the potential to operate at
high frequencies. The wide bandgap of the material allows a high critical electric
field to be sustained which can lead to the design of devices with a shorter drift
region, and therefore with lower on-state resistance, if compared to a silicon-based
device with the same breakdown voltage. The use of an AlGaN/GaN heterostructure
allows the formation of a two-dimensional electron gas (2DEG) at the heterointerface
where carriers can reach very high mobility values. These properties can lead to the
production of High Electron Mobility Transistors (HEMTs) and Schottky barrier diodes
with superior performance, even when compared to devices based on state-of-the-art
technologies such as Silicon Carbide or superjunctions. Furthermore, epitaxial growth
of GaN layers on silicon wafers allows a significant reduction in the production cost
and makes these devices competitive from a price perspective. This thesis will deal
with a variety of topics concerning the characterization, design and optimization of
AlGaN/GaN HEMTs and Schottky diodes with a 600 to 650V rating. Discussion will
span several topics from device cross-section physics to circuit implementation and will
be based on both experimental results and advanced modelling.
More specifically, the thesis is concerned with the characterization of AlGaN/GaN
Schottky diodes and extraction of their main parameters such as ideality factor,
barrier height and series resistance. A thorough investigation of their reverse recovery
performance and a comparison to competing technologies is also given. Several topics
which concern the operation of AlGaN/GaN HEMTs are then discussed. The underlying
physics of p-gate enhancement mode transistors are analysed followed by a discussion
of the challenges associated with the implementation of these devices at a circuit level.
Finally, a comparison of the performance of a specific area-saving layout (Bonding pad
over active area) and a conventional design is given.
The thesis aims to significantly enhance the understanding of the behaviour of
these devices to enable better or new commercial designs to emerge.</dcterms:abstract>
   <uketdterms:institution>University of Cambridge</uketdterms:institution>
   <dcterms:issued>2017-11-24</dcterms:issued>
   <dc:type>Thesis</dc:type>
   <uketdterms:qualificationlevel>Doctoral</uketdterms:qualificationlevel>
   <uketdterms:qualificationname>Doctor of Philosophy (PhD)</uketdterms:qualificationname>
   <dc:language>en</dc:language>
   <dcterms:isReferencedBy xsi:type="dcterms:URI">https://www.repository.cam.ac.uk/handle/1810/274912</dcterms:isReferencedBy>
   <dcterms:license>https://apollo8-f-pro.lib.cam.ac.uk/bitstreams/36b1f237-eead-4ba3-94be-79cf6e108f2d/download</dcterms:license>
   <uketdterms:checksum xsi:type="uketdterms:MD5">87eda9de84448d1f82354d60eee3eb5f</uketdterms:checksum>
   <dc:identifier xsi:type="dcterms:URI">https://apollo8-f-pro.lib.cam.ac.uk/bitstreams/4aa6f889-0135-472a-b444-48a2ffb28bac/download</dc:identifier>
   <uketdterms:checksum xsi:type="uketdterms:MD5">a1bc290927dbac0ce906e1c20796c6c8</uketdterms:checksum>
   <dc:rights>https://www.rioxx.net/licenses/all-rights-reserved/</dc:rights>
   <dc:subject>GaN</dc:subject>
   <dc:subject>HEMT</dc:subject>
   <dc:subject>Schottky</dc:subject>
   <dc:subject>power</dc:subject>
   <dc:subject>semiconductor</dc:subject>
   <dc:subject>diode</dc:subject>
   <dc:subject>high voltage</dc:subject>
</uketd_dc:uketddc>
</metadata></record></GetRecord></OAI-PMH>