Sample Set B Description: Variation in V/III ratio during epilayer growth AFM data: RMS roughness (Figure 8 (a)) V/III RMS roughness ERROR 1 nm nm 15 19.05339 0.52155 23 15.30448 0.25429 38 9.69986 0.09264 76 10.58178 1.09033 152 16.2411 1.15952 300 17.32584 1.22446 600 25.32199 1.95377 1200 32.27322 1.10226 AFM data: Feature size extracted from AFM measurements (Figure 8 (b)) V/III Feature size (para) ERROR Feature size (perp) ERROR 1 µm µm µm µm 15 0.88369 0.06134 1.30827 0.02084 23 0.90853 0.04483 1.21607 0.09013 38 0.67956 0.02296 1.66096 0.04771 76 0.63123 0.05399 2.22717 0.20204 152 0.73255 0.07492 2.78227 0.04791 300 0.75333 0.10592 3.01714 0.18902 600 0.93754 0.06819 1.9962 0.10627 1200 0.99911 0.08365 1.14057 0.03329 XRD phase analysis: (Figure 10 (a)) The relative portion of the zincblende GaN phase, wurtzite GaN phase and highly defective material have been extracted from XRD intensity profiles of the 113 and 1-103 reflections. These profiles have been fitted by three Pseudo-Voigt functions. V/III zincblende wurtzite mixed mixed & wurtzite 1 I(1-13) I(1-103) I(mix) I(1-103) + I(mix) 15 99.9 0.04 0.05 0.09 23 96.75 1.29 1.97 3.26 38 97.65 0.98 1.37 2.35 76 95.48 2.14 2.38 4.52 152 89.9 4.36 5.74 10.1 300 91.93 4.73 3.34 8.07 600 80.67 9.53 9.8 19.33 1200 38.68 58.78 2.54 61.32 XRD w-Rocking curves FWHM (Figure 10 (b)) V/III FWHM (para) FWHM (perp) 1 arcmin arcmin 15 32.18 26.48 23 31.74 27.44 38 35.86 31.52 76 38.88 36 152 38.99 35.41 300 38.76 34.54 600 38.96 34.33 1200 46.28 41.36